DocumentCode
2164417
Title
Sensitivity-enhanced SERS substrate fabrication by nanoimprinting compressed PDMS elastomer
Author
Wen-Kai Kuo ; Jia-Nan Yan ; Wing-Ming Chou ; Hsin-Her Yu
Author_Institution
Dept. of Electro-Opt., Nat. Formosa Univ., Yunlin, Taiwan
fYear
2013
fDate
18-22 Aug. 2013
Firstpage
139
Lastpage
140
Abstract
This paper reports a low-cost fabrication method of sensitivity-enhanced SERS substrate using nanoimprinting lithography. A PDMS elastomer with grating structure is deformed by compressing to achieve the better pitch for SERS substrate. Experimental results show that the sensitivity can be enhanced about three times by this method.
Keywords
compressibility; diffraction gratings; elastomers; nanolithography; optical fabrication; optical polymers; substrates; surface enhanced Raman scattering; compressed PDMS elastomer; deformation; grating structure; nanoimprinting lithography; sensitivity-enhanced SERS substrate fabrication; Gratings; Nanobioscience; Optical surface waves; Rough surfaces; Substrates; Surface roughness; Surface waves;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical MEMS and Nanophotonics (OMN), 2013 International Conference on
Conference_Location
Kanazawa
ISSN
2160-5033
Print_ISBN
978-1-4799-1512-5
Type
conf
DOI
10.1109/OMN.2013.6659098
Filename
6659098
Link To Document