Title :
Complementary metamaterial infrared absorber
Author :
Pitchappa, Prakash ; Chong Pei Ho ; Kropelnicki, Piotr ; Chengkuo Lee
Author_Institution :
Dept. of Electr. & Comput. Eng., Nat. Univ. of Singapore, Singapore, Singapore
Abstract :
Complementary metamaterial based infrared (IR) absorber using complementary metal oxide semiconductor (CMOS) compatible material is presented. The robustness of the proposed device is ensured by studying the effect of fabrication deviation on the device performance. The measured absorption was 70% in the near IR region. The complementary metamaterial absorber can be engineered to provide near unity absorption in IR region.
Keywords :
CMOS integrated circuits; infrared spectra; optical fabrication; optical metamaterials; CMOS compatible material; complementary metal oxide semiconductor compatible material; complementary metamaterial infrared absorber; fabrication deviation effect; Absorption; CMOS integrated circuits; Electromagnetics; Fabrication; Metals; Metamaterials; Absorber; CMOS compatible; Complementary Metamaterial; Infrared;
Conference_Titel :
Optical MEMS and Nanophotonics (OMN), 2013 International Conference on
Conference_Location :
Kanazawa
Print_ISBN :
978-1-4799-1512-5
DOI :
10.1109/OMN.2013.6659100
