Optimal design of photodetector with multi-slit grating

Author

Takeda, Akiko ; Aihara, Takuma ; Fukuhara, Masashi ; Ishii, Y. ; Fukuda, Motohisa

Author_Institution

Toyohashi Univ. of Technol., Toyohashi, Japan

fYear

2013

fDate

18-22 Aug. 2013

Firstpage

145

Lastpage

146

Abstract

We propose an optimal structure for an Au/Si Schottky-type photodetector with a multi-slit grating that excites surface plasmon polaritons (SPPs). The intensity of the SPPs excited by the grating is simulated using the finite-difference time-domain method. The calculation results show that the optimum Au film thickness and slit pitch were determined by the resonance effects of SPPs inside the slit and the in-phase interference of the SPPs generated by each slit, respectively. Using these results, we fabricate and evaluate an optimal photodetector with the grating. We also confirm the operation of metal-oxide-semiconductor field-effect transistors by the SPP-enhanced photocurrent.

Keywords

MOSFET; diffraction gratings; elemental semiconductors; finite difference time-domain analysis; gold; metallic thin films; optical design techniques; optical fabrication; photodetectors; polaritons; silicon; surface plasmons; Au-Si; SPP-enhanced photocurrent; Schottky-type photodetector; finite-difference time-domain method; gold film thickness; in-phase interference; metal-oxide-semiconductor field-effect transistors; multislit grating; optical fabrication; optimal design; slit pitch; surface plasmon polaritons; Films; Gold; Gratings; Photoconductivity; Photodetectors; Plasmons; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS and Nanophotonics (OMN), 2013 International Conference on

Conference_Location

Kanazawa

ISSN

2160-5033

Print_ISBN

978-1-4799-1512-5

Type

conf

DOI

10.1109/OMN.2013.6659101

Filename

6659101