DocumentCode :
2164526
Title :
A general physical model for short-channel double-gate SOI MOSFETS
Author :
Li, Zheming ; Woo, Jason C S
Author_Institution :
Dept. of Electr. Eng., California Univ., Los Angeles, CA, USA
fYear :
1997
fDate :
6-9 Oct 1997
Firstpage :
86
Lastpage :
87
Abstract :
Previous works on the modeling of short-channel double-gate devices in the above-threshold regime were based mainly on modifying the current expressions for bulk devices. These models would probably be of limited utility because they do not account for the central physical characteristic of the double-gate devices, namely the coupling of the two channels. In this paper, we present a general physical model which explicitly accounts for physical effects such as channel coupling and drain induced conductance enhancement (DICE). The model is a major extension of the single-gate SOI MOSFET model to the double-gate case
Keywords :
MOSFET; carrier mobility; electric admittance; semiconductor device models; silicon-on-insulator; Si; above-threshold regime; channel coupling; drain induced conductance enhancement; general physical device models; short-channel double-gate SOI MOSFETS; Back; CMOS technology; Electrons; Equations; MOSFETs; Mathematical model; Semiconductor device modeling; Semiconductor process modeling; Transconductance; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference, 1997. Proceedings., 1997 IEEE International
Conference_Location :
Fish Camp, CA
ISSN :
1078-621X
Print_ISBN :
0-7803-3938-X
Type :
conf
DOI :
10.1109/SOI.1997.634945
Filename :
634945
Link To Document :
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