Title :
First demonstration of 4H-SiC RF bipolar junction transistors on a semi-insulating substrate with fT/fMAX of 7/5.2 GHz
Author :
Zhao, Feng ; Perez-Wurfl, Ivan ; Huang, Chih-Fang ; Torvik, John ; Zeghbroeck, B.V.
Author_Institution :
Adv. Power Technol., Moulder Adv. Technol. Center, Boulder, CO, USA
Abstract :
4H-SiC RF BJTs on a semi-insulating (>105 Ω-cm) substrate were designed and fabricated for the first time using an n-p-n triple mesa-etch and interdigitated emitter-base finger design. On-wafer small signal S-parameter measurements were performed on a 4-finger device with 3 μm emitter stripe width and 150 μm finger length. Both, the current gain and unilateral power gain, were calculated from the measured S-parameters, yielding an fT of 7 GHz and an fMAX of 5.2 GHz biased in common-emitter configuration at JE = 10.6 kA/cm2 and VCE = 20 V. These are the highest RF figures of merit reported to date for any SiC bipolar transistor. The calculated maximum available power gain (GMAX) is 18.6-dB at 500 MHz and 12.4-dB at 1 GHz, demonstrating the potential of 4H-SiC BJTs for both UHF and L-band applications.
Keywords :
S-parameters; etching; heterojunction bipolar transistors; microwave bipolar transistors; p-n heterojunctions; silicon compounds; wide band gap semiconductors; 1 GHz; 12.4 dB; 150 micron; 18.6 dB; 20 V; 4H-SiC RF bipolar junction transistors; 5.2 GHz; 500 MHz; 7 GHz; SiC; common-emitter configuration; interdigitated emitter-base finger design; n-p-n triple mesa-etch; on-wafer small signal S-parameter measurements; semi-insulating substrate; Bipolar transistors; Current measurement; Fingers; Gain measurement; Length measurement; Performance evaluation; Power measurement; Radio frequency; Scattering parameters; Silicon carbide;
Conference_Titel :
Microwave Symposium Digest, 2005 IEEE MTT-S International
Print_ISBN :
0-7803-8845-3
DOI :
10.1109/MWSYM.2005.1517145