Title :
Widely tunable high-Q evanescent-mode resonators using flexible polymer substrates
Author :
Hajela, Shloke ; Gong, Xun ; Chappell, William J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
Abstract :
Widely tunable high-Q evanescent-mode resonators are created using layer-by-layer polymer stereolithography process. The ability of polymer stereolithography process to fabricate thin flexible 3D structures with small fabrication tolerances enables the realization of highly loaded tunable evanescent-mode resonators. A tunable frequency range of 5.4-10.9 GHz, which corresponds to an equivalent capacitance tunability of 400%, is obtained with quality factors ranging from 745 to 1,580 over the tunable frequency range.
Keywords :
cavity resonators; polymers; stereolithography; 5.4 to 10.9 GHz; cavity resonators; equivalent capacitance tenability; fabrication tolerance; flexible polymer substrates; high-Q evanescent-mode resonators; layer-by-layer polymer stereolithography process; thin flexible 3D structures; tunable evanescent-mode resonators; Capacitance; Capacitors; Cavity resonators; Ferroelectric materials; Fingers; Polymers; Q factor; Resonance; Stereolithography; Tunable circuits and devices;
Conference_Titel :
Microwave Symposium Digest, 2005 IEEE MTT-S International
Print_ISBN :
0-7803-8845-3
DOI :
10.1109/MWSYM.2005.1517172