Title :
Investigation of under bump metallization systems for flip-chip assemblies
Author :
Teo, Poi Siong ; Huang, Yu-Wen ; Tung, Chih Hang ; Marks, Michael Raj ; Lim, Thiam Beng
Author_Institution :
Singapore Inst. of Microelectron., Singapore
Abstract :
The objective of this work was to investigate the quality of Under Bump Metallization (UBM) systems used for solder bump flip chip applications. These three commercial UBM systems were (i)Al/NiV/Cu UBM with print-and-reflow solder, (ii)Ti-W/Cu UBM with electroplated solder and (iii) Electroless Ni/Au UBM with print-and-reflow solder. The solder was of an eutectic Sn/Pb composition. UBM quality in terms of thermal stability, corrosion-resistance and thermal-mechanical reliability were investigated using various multiple solder reflow passes, high temperature storage, pressure cooker test and temperature cycling. Analytical tools such as Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM) and Energy Dispersive X-ray Spectrometry (EDS) were used to analyze the metallurgy reactions and failure modes. This study showed that none of the three systems investigated out-performed the other two in all aspects in the tests conducted
Keywords :
flip-chip devices; metallisation; reflow soldering; Al-NiV-Cu; Ni-Au; Sn-Pb; Sn/Pb eutectic alloy; TiW-Cu; corrosion resistance; electroplated solder; energy dispersive X-ray spectrometry; failure mode; flip-chip assembly; high temperature storage; metallurgy reaction; multiple solder reflow; pressure cooker test; print-and-reflow solder; scanning electron microscopy; temperature cycling; thermal stability; thermal-mechanical reliability; transmission electron microscopy; under bump metallization; Failure analysis; Flip chip; Gold; Metallization; Scanning electron microscopy; Temperature; Testing; Thermal stability; Tin; Transmission electron microscopy;
Conference_Titel :
Electronic Components & Technology Conference, 2000. 2000 Proceedings. 50th
Conference_Location :
Las Vegas, NV
Print_ISBN :
0-7803-5908-9
DOI :
10.1109/ECTC.2000.853112