• DocumentCode
    2166243
  • Title

    Q/M distribution in pulsed corona powder coating spray cone

  • Author

    Inculet, I.I. ; Castle, G.S.P.

  • Author_Institution
    Dept. of Electr. Eng., Univ. of Western Ontario, London, Ont., Canada
  • Volume
    2
  • fYear
    1995
  • fDate
    8-12 Oct 1995
  • Firstpage
    1289
  • Abstract
    The advantages of using a high voltage pulsed corona superimposed on a lower voltage DC bias electrostatic field have been well-documented for the case of electrostatic precipitation of high resistivity dusts. The high voltage, short pulses achieve adequate charge-to-mass ratios, while reducing the total ionic current landing on the dust layer and thus minimizing the deleterious back corona effects. To throw further light on this corona charging process, which up to the present has not been put to wide use by the electrostatic painting industry, the authors present a preliminary experimental study applied to powder coating. Measurements are presented for the Q/M ratios of the charged powder fractions collected in an ensemble of 5 double Faraday pails mounted in a cross behind the target plane. The results indicate, on average, a substantial increase in the charge-to-mass ratio of powder, combined with a reduction of the total ionic current which bombards the painting target
  • Keywords
    charge measurement; corona; electrostatics; powder technology; spray coating techniques; DC bias electrostatic field; Q/M distribution; charge-to-mass ratio; corona charging process; double Faraday pails; electrostatic painting industry; high voltage pulsed corona; ionic current; measurements; painting target plane; pulsed corona powder coating; short pulses; spray cone; Coatings; Conductivity; Corona; Current measurement; Electrostatic measurements; Painting; Powders; Q measurement; Spraying; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Industry Applications Conference, 1995. Thirtieth IAS Annual Meeting, IAS '95., Conference Record of the 1995 IEEE
  • Conference_Location
    Orlando, FL
  • ISSN
    0197-2618
  • Print_ISBN
    0-7803-3008-0
  • Type

    conf

  • DOI
    10.1109/IAS.1995.530450
  • Filename
    530450