Title :
Experimental evaluation of carrier transport and device design for planar symmetric/asymmetric double-gate/ground-plane CMOSFETs
Author :
Ieong, M. ; Jones, E.C. ; Kanarsky, T. ; Ren, Z. ; Dokumaci, O. ; Roy, R.A. ; Shi, L. ; Furukawa, T. ; Taur, Yuan ; Miller, R.J. ; Wong, H.-S.P.
Author_Institution :
IBM Microelectron. Semicond. Res. & Dev. Center (SRDC), Hopewell Junction, NY, USA
Abstract :
Demonstrated double-gate devices with excellent drive current and short-channel-effect control. The double-gate devices exhibit ideal linear, sub-threshold slope of 60 mV/dec and better than ideal saturated sub-threshold slope of 55 mV/dec. The effective mobility in all device structures follows the universal mobility curve. The symmetric double-gate offers 20% mobility enhancement over a GP device at 1.0 V gate over-drive. Because the double-gate can be operated at a much lower effective-field, substantial mobility enhancement (>2X) over scaled bulk CMOS can be achieved. For the first time, DC operation of double-gate CMOS inverters are demonstrated down to Vdd=0.3 V.
Keywords :
CMOS logic circuits; MOSFET; carrier mobility; integrated circuit measurement; logic gates; work function; 0.3 V; 1.0 V; CMOS inverters; DC operation; carrier transport; drive current; effective mobility; gate over-drive; linear sub-threshold slope; mobility enhancement; saturated sub-threshold slope; short-channel-effect control; symmetric/asymmetric double-gate/ground-plane CMOSFETs; universal mobility curve; CMOSFETs; Doping; FETs; Inverters; MOSFET circuits; Microelectronics; Research and development; Semiconductor device modeling; Silicon; Threshold voltage;
Conference_Titel :
Electron Devices Meeting, 2001. IEDM '01. Technical Digest. International
Conference_Location :
Washington, DC, USA
Print_ISBN :
0-7803-7050-3
DOI :
10.1109/IEDM.2001.979532