DocumentCode :
2167243
Title :
A CMOS SOI Stacked Shunt Switch with Sub-500ps Time Constant and 19-Vpp Breakdown
Author :
Levy, Cooper S. ; Asbeck, P.M. ; Buckwalter, James F.
Author_Institution :
Univ. of California San Diego, La Jolla, CA, USA
fYear :
2013
fDate :
13-16 Oct. 2013
Firstpage :
1
Lastpage :
4
Abstract :
This work demonstrates a shunt stacked-FET switch with both high switching speed (~1ns) and high RF voltage handling capability (30 dBm). A key development in the implementation of this stacked structure is a dynamic gate bias adjustment to track the voltage swing. Measured performance for a shunt capacitor-switch network fabricated in 45-nm CMOS SOI (Leff = 40 nm) is characterized. The switch achieves a RonCoff time constant of less than 500ps, and is shown to handle a 19Vpp RF signal swing. These characteristics enable use in digital dynamic load modulation of power amplifiers at bandwidths above 10 MHz.
Keywords :
CMOS integrated circuits; capacitors; field effect transistor switches; silicon-on-insulator; CMOS SOI stacked shunt switch; RF signal swing; digital dynamic load modulation; dynamic gate bias adjustment; power amplifiers; shunt capacitor-switch network; shunt stacked-FET switch; size 45 nm; stacked structure; voltage 19 V; voltage swing; CMOS integrated circuits; Logic gates; MOS devices; Modulation; Radio frequency; Switches; Voltage measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductor Integrated Circuit Symposium (CSICS), 2013 IEEE
Conference_Location :
Monterey, CA
Type :
conf
DOI :
10.1109/CSICS.2013.6659196
Filename :
6659196
Link To Document :
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