Title :
GaN HFETs with excellent low noise performance at low power levels through the use of thin AlGaN Schottky barrier layer
Author :
Hussain, T. ; Kurdoghlian, A. ; Hashimoto, P. ; Wong, W.-S. ; Wetzel, M. ; Moon, J.-S. ; McCray, L. ; Micovic, M.
Author_Institution :
HRL Labs., Malibu, CA, USA
Abstract :
State-of-the-art noise performance of AlGaN/GaN HFETs in the 2-20 GHz frequency range for ultra low power operation of 10 mW (10 mA drain current and 1 V drain bias) is reported. A record low minimum noise figure (NF/sub min/) of 0.4 dB with 16 dB associated gain at 5 GHz was measured. The NF/sub min/ is below 0.8 dB across the 2-12 GHz frequency-band, with associated gains of better than 12.5 dB. This noise performance is achieved by using a vertically scaled device structure where the thickness of the AlGaN Schottky layer is reduced to 15 nm compared to the standard thickness of 30 nm previously used for our baseline devices. Indeed. NF/sub min/ of the scaled device is better than the baseline device across the 2-20 GHz band.
Keywords :
III-V semiconductors; Schottky barriers; aluminium compounds; gallium compounds; junction gate field effect transistors; low-power electronics; microwave field effect transistors; semiconductor device noise; wide band gap semiconductors; 0.4 dB; 1 V; 10 mA; 10 mW; 16 dB; 2 to 20 GHz; AlGaN-GaN; AlGaN/GaN HFET; Schottky barrier layer; gain; noise figure; ultra low power operation; vertically scaled device; Aluminum gallium nitride; Frequency; Gain measurement; Gallium nitride; HEMTs; MODFETs; Noise figure; Noise level; Noise measurement; Noise reduction;
Conference_Titel :
Electron Devices Meeting, 2001. IEDM '01. Technical Digest. International
Conference_Location :
Washington, DC, USA
Print_ISBN :
0-7803-7050-3
DOI :
10.1109/IEDM.2001.979573