DocumentCode :
2167639
Title :
Achieving the Best Thermal Performance for GaN-on-Diamond
Author :
Pomeroy, J. ; Bernardoni, Mirko ; Sarua, Andrei ; Manoi, A. ; Dumka, D.C. ; Fanning, D.M. ; Kuball, M.
Author_Institution :
H.H. Wills Phys. Lab., Univ. of Bristol, Bristol, UK
fYear :
2013
fDate :
13-16 Oct. 2013
Firstpage :
1
Lastpage :
4
Abstract :
GaN-based RF transistors offer impressive power densities, although to achieve the maximum potential offered by GaN, thermal management must be improved beyond the current GaN-on-SiC devices. By using diamond, rather than SiC substrates, transistor thermal resistance can be significantly reduced. It is important to experimentally verify thermal resistance, rather than relying solely on simulation expectations, using measurement results to aid further optimization. The novel thermal characterization methodology presented here combines Raman thermography and simulation to determine the substrate thermal conductivity and GaN/substrate thermal resistance in GaN-on-diamond devices. Measured GaN-on-diamond interfacial thermal resistance is similar to reported values for GaN-on-SiC, whereas the diamond substrate thermal conductivity is substantially higher, resulting in a significantly improved thermal resistance with respect to GaN-on-SiC, with great potential for further improvement.
Keywords :
III-V semiconductors; gallium compounds; high electron mobility transistors; silicon compounds; thermal conductivity; thermal management (packaging); thermal resistance; wide band gap semiconductors; GaN; GaN-based RF transistor; GaN-on-SiC device; GaN-on-diamond; Raman thermography; SiC; interfacial thermal resistance; power density; substrate thermal conductivity; thermal management; transistor thermal resistance; Diamonds; Gallium nitride; Substrates; Temperature measurement; Thermal conductivity; Thermal resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductor Integrated Circuit Symposium (CSICS), 2013 IEEE
Conference_Location :
Monterey, CA
Type :
conf
DOI :
10.1109/CSICS.2013.6659210
Filename :
6659210
Link To Document :
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