DocumentCode :
2167665
Title :
Advanced RF IV Waveform Engineering Tool for Use in Device Technology Optimization: RF Pulsed Fully Active Harmonic Load Pull with Synchronized 3eV Laser
Author :
Casbon, M.A. ; Tasker, P.J. ; Wei-Chou Wang ; Che-Kai Lin ; Wen-kai Wang ; Wohlmuth, W.
Author_Institution :
Cardiff Univ., Cardiff, UK
fYear :
2013
fDate :
13-16 Oct. 2013
Firstpage :
1
Lastpage :
4
Abstract :
The RF performance obtainable from a device often falls short of the expectations raised by analysis of the DCIV curves. This difference is typically associated with thermal or trapping effects. Hence, RF performance is traditionally assessed using load pull techniques, which can identify the optimum operating conditions, but cannot explain the shortfall. It has previously been shown that RF IV Waveform Engineering methods can give more insight to why there are differences without necessarily identifying their cause [1]. Here we show how adding RF pulse capability can help identify thermal contributions, and a synchronized 3eV Laser excitation can help identify and clear trapping contributions. Together these methods provide a powerful diagnostic tool for device technology optimization.
Keywords :
optimisation; power amplifiers; radiofrequency amplifiers; radiofrequency measurement; DCIV curves; RF IV Waveform Engineering tool; RF performance; RF pulsed fully active harmonic load pull technique; device technology optimization; electron volt energy 3 eV; laser excitation; thermal effect; trapping effect; Charge carrier processes; Current slump; Knee; Laser excitation; Performance evaluation; Radio frequency; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductor Integrated Circuit Symposium (CSICS), 2013 IEEE
Conference_Location :
Monterey, CA
Type :
conf
DOI :
10.1109/CSICS.2013.6659212
Filename :
6659212
Link To Document :
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