DocumentCode :
2167942
Title :
Double Recessed GaAs pHEMTs for 20-50 V Power Switching
Author :
Pala, Vipindas ; Hella, Mona ; Chow, T.P.
Author_Institution :
Center of Ind. Electron., Rensselaer Polytech. Inst., Troy, NY, USA
fYear :
2013
fDate :
13-16 Oct. 2013
Firstpage :
1
Lastpage :
4
Abstract :
A normally-OFF RF pHEMT process is optimized for a blocking voltage in the 20-50V range for power switching ICs. Due to their superior material properties, the intrinsic figure of merit for pHEMT switching devices show an order of magnitude improvement over the state-of-the-art Silicon NMOS transistors and in the same range as lateral GaN HEMTs. In a scenario where innovations in silicon based low voltage power transistors have saturated, this approach is a new way of breaking the paradigm and making large leaps in performance.
Keywords :
III-V semiconductors; gallium arsenide; high electron mobility transistors; power integrated circuits; power semiconductor switches; GaAs; double recessed pHEMT; intrinsic figure of merit; normally-OFF RF pHEMT process; pHEMT switching devices; power switching IC; silicon NMOS transistors; silicon based low voltage power transistors; voltage 20 V to 50 V; Electric fields; Gallium arsenide; Logic gates; MOSFET; PHEMTs; Silicon; Switches;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductor Integrated Circuit Symposium (CSICS), 2013 IEEE
Conference_Location :
Monterey, CA
Type :
conf
DOI :
10.1109/CSICS.2013.6659223
Filename :
6659223
Link To Document :
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