Title :
DUV attenuating structures in fused silica induced by ultrafsat laser radiation
Author :
Oshemkov, Sergey ; Dmitriev, Vladimir ; Zait, Eitan ; Ben-Zvi, Guy
Author_Institution :
Pixer Technol., Karmiel
Abstract :
In this paper we present the method for high-speed 3D structures patterning inside the volume of photomask substrate without affecting front mask surface and absorber layer using ultrafast laser and the results of investigation of DUV radiation attenuation by created structures.
Keywords :
high-speed optical techniques; laser beam effects; laser beams; laser materials processing; light absorption; masks; silicon compounds; DUV radiation attenuation; SiO2; fused silica structures; high-speed 3D structures patterning; photomask substrate; ultrafast laser radiation; Energy resolution; Laser beams; Machine vision; Optical attenuators; Optical pulses; Silicon compounds; Solid lasers; Surface emitting lasers; Throughput; Visualization;
Conference_Titel :
Lasers and Electro-Optics, 2007 and the International Quantum Electronics Conference. CLEOE-IQEC 2007. European Conference on
Conference_Location :
Munich
Print_ISBN :
978-1-4244-0931-0
Electronic_ISBN :
978-1-4244-0931-0
DOI :
10.1109/CLEOE-IQEC.2007.4386677
