DocumentCode :
2169628
Title :
The future of flash memory: Is floating gate technology doomed to lose the race?
Author :
Wellekens, Dirk ; Van Houdt, Jan
fYear :
2008
fDate :
2-4 June 2008
Firstpage :
189
Lastpage :
194
Abstract :
Since the very beginning of the flash memory era, the market has been dominated by the floating gate technology. However, as floating gate flash continues along a very steep scaling path, more and more barriers start to appear, limiting further scaling possibilities of the technology. At the same time, other concepts are preparing to take over. This paper concentrates on the prospect of high-k materials to extend floating gate scaling and explores the possibilities and promises these materials offer to further extend the floating gate concept as the dominant flash technology.
Keywords :
dielectric materials; flash memories; random-access storage; flash memory; floating gate scaling; floating gate technology; high-k materials; nonvolatile memory; Aluminum oxide; Character generation; Dielectric losses; Flash memory; High K dielectric materials; High-K gate dielectrics; Nonvolatile memory; Semiconductor materials; Silicon on insulator technology; Voltage; Flash memory; floating gate; high-k materials; nonvolatile memory;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Circuit Design and Technology and Tutorial, 2008. ICICDT 2008. IEEE International Conference on
Conference_Location :
Austin, TX
Print_ISBN :
978-1-4244-1810-7
Electronic_ISBN :
978-1-4244-1811-4
Type :
conf
DOI :
10.1109/ICICDT.2008.4567276
Filename :
4567276
Link To Document :
بازگشت