Title :
Enhance Profiling-Based Scan Chain Diagnosis by Pattern Masking
Author :
Cheng, Wu-Tung ; Huang, Yu
Author_Institution :
Mentor Graphics Corp., Wilsonville, OR, USA
Abstract :
In prior work, profiling-based chain diagnosis methodologies were developed. This paper discusses the challenges associated with profiling-based chain diagnosis in the production test environment with limited failure buffer capacity on tester. We propose the following two pattern masking application flows to enhance diagnosis resolution in this scenario: (1) generic pattern masking and (2) adaptive pattern masking. Experimental results illustrate that pattern masking will enable profiling-based scan chain diagnosis in volume diagnosis environment.
Keywords :
automatic test equipment; fault diagnosis; production testing; diagnosis resolution; enhance profiling-based scan chain diagnosis; pattern masking; production test environment; Adaptation model; Algorithm design and analysis; Automatic test pattern generation; Circuit faults; Load modeling; Noise; Production; adaptive masking; chain diagnosis; generic masking; pattern masking; resolution;
Conference_Titel :
Test Symposium (ATS), 2010 19th IEEE Asian
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-8841-4
DOI :
10.1109/ATS.2010.52