DocumentCode :
2169687
Title :
Enhance Profiling-Based Scan Chain Diagnosis by Pattern Masking
Author :
Cheng, Wu-Tung ; Huang, Yu
Author_Institution :
Mentor Graphics Corp., Wilsonville, OR, USA
fYear :
2010
fDate :
1-4 Dec. 2010
Firstpage :
255
Lastpage :
260
Abstract :
In prior work, profiling-based chain diagnosis methodologies were developed. This paper discusses the challenges associated with profiling-based chain diagnosis in the production test environment with limited failure buffer capacity on tester. We propose the following two pattern masking application flows to enhance diagnosis resolution in this scenario: (1) generic pattern masking and (2) adaptive pattern masking. Experimental results illustrate that pattern masking will enable profiling-based scan chain diagnosis in volume diagnosis environment.
Keywords :
automatic test equipment; fault diagnosis; production testing; diagnosis resolution; enhance profiling-based scan chain diagnosis; pattern masking; production test environment; Adaptation model; Algorithm design and analysis; Automatic test pattern generation; Circuit faults; Load modeling; Noise; Production; adaptive masking; chain diagnosis; generic masking; pattern masking; resolution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Test Symposium (ATS), 2010 19th IEEE Asian
Conference_Location :
Shanghai
ISSN :
1081-7735
Print_ISBN :
978-1-4244-8841-4
Type :
conf
DOI :
10.1109/ATS.2010.52
Filename :
5692256
Link To Document :
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