Title :
Record Q spiral inductors in standard CMOS
Author :
Tiemeijer, L.F. ; Leenaerts, D. ; Pavlovic, N. ; Havens, R.J.
Author_Institution :
Philips Res. Labs., Eindhoven, Netherlands
Abstract :
High-Q spiral inductors, either realized as discrete elements in thin-film technologies, or as integrated components in IC processes, are essential to realize key RF circuitry like VCO´s and LNA´s. We have demonstrated for the first time that by dividing a spiral inductor into four parallel current paths of equal resistance and inductance current crowding can be suppressed, allowing a record Q of 15 for a 2 GHz 5 nH inductor in standard CMOS, representing a 40 % improvement over previous art. The proposed division into parallel current paths can be realized without process modifications, reduces CMP dishing, and is expected to provide even larger performance gains in terms of quality factor Q and inductor area for IC and thin-film processes employing thicker metal layers and low-K materials.
Keywords :
CMOS analogue integrated circuits; Q-factor; UHF integrated circuits; aluminium; equivalent circuits; inductors; 2 GHz; Al; Al layers; RF circuitry; high-Q spiral inductors; inductance current crowding suppression; inductor area; inductor. layout; parallel current paths; quality factor; standard CMOS process; thin-film process; Art; CMOS technology; Inductance; Integrated circuit technology; Proximity effect; Radio frequency; Radiofrequency integrated circuits; Spirals; Thin film circuits; Thin film inductors;
Conference_Titel :
Electron Devices Meeting, 2001. IEDM '01. Technical Digest. International
Conference_Location :
Washington, DC, USA
Print_ISBN :
0-7803-7050-3
DOI :
10.1109/IEDM.2001.979674