The rise of the 3rd dimension for system intergration

Author

Beyne, Eric

Author_Institution

IMEC, Leuven

fYear

2006

fDate

5-7 June 2006

Firstpage

1

Lastpage

5

Abstract

Electronic interconnection and packaging is mainly performed in a planar, 2D design style. Further miniaturization and performance enhancement of electronic systems will more and more require the use of 3D interconnection schemes. Key technologies for realizing true 3D interconnect schemes are the realization of vertical connections, either through the Si-die or through the multilayer interconnect with embedded die. Different applications require different complexities of 3D-interconnectivity. Therefore, different technologies may be used. These can be categorized as a more traditional packaging approach, a wafer-level-packaging, WLP (`above´ passivation), approach and a foundry level (`below´ passivation) approach. We define these technologies as respectively 3D-SIP, 3D-WLP and 3D-SIC. In this paper, these technologies are discussed in more detail

Keywords

integrated circuit interconnections; integrated circuit yield; silicon; system-in-package; system-on-chip; 3D interconnection schemes; 3D-SIC; 3D-SIP; 3D-WLP; Si; electronic interconnection; electronic packaging; embedded die; foundry level approach; multilayer interconnect; system integration; vertical connections; wafer level packaging; Assembly; Electronics packaging; Integrated circuit interconnections; Integrated circuit technology; Passivation; Semiconductor device packaging; Stacking; Substrates; Tiles; Wiring;

fLanguage

English

Publisher

ieee

Conference_Titel

Interconnect Technology Conference, 2006 International

Conference_Location

Burlingame, CA

Print_ISBN

1-4244-0104-6

Type

conf

DOI

10.1109/IITC.2006.1648629

Filename

1648629