DocumentCode :
2170895
Title :
Thermal conductivity of SOI device layers
Author :
Asheghi, Mehdi ; Ju, Y. Sungtaek ; Goodson, Kenneth E.
Author_Institution :
Dept. of Mech. Eng., Stanford Univ., CA, USA
fYear :
1997
fDate :
6-9 Oct 1997
Firstpage :
134
Lastpage :
135
Abstract :
Summary form only given. Self heating affects the performance and reliability of SOI circuits, particularly during ESD or in circuits requiring impedance matching. The temperature field in SOI devices is strongly influenced by heat conduction along the Si device layer, whose thermal conductivity is dominated by phonon transport and is reduced by scattering mechanisms. Although SOI device simulations need accurate values of the device-layer thermal conductivity, the impact of phonon-boundary scattering is not known. We use data and predictions to show that boundary scattering is very important for thin-film SOI and provides a model for device simulations
Keywords :
electrostatic discharge; phonon-impurity interactions; phonon-phonon interactions; semiconductor device models; semiconductor device reliability; silicon-on-insulator; thermal analysis; thermal conductivity; ESD; SOI device layers; SOI device simulations; Si; heat conduction; impedance matching; model; phonon transport; phonon-boundary scattering; scattering mechanisms; self heating; temperature field; thermal conductivity; thin-film SOI; Circuit simulation; Electrostatic discharge; Heating; Impedance matching; Phonons; Predictive models; Scattering; Temperature; Thermal conductivity; Thin film devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference, 1997. Proceedings., 1997 IEEE International
Conference_Location :
Fish Camp, CA
ISSN :
1078-621X
Print_ISBN :
0-7803-3938-X
Type :
conf
DOI :
10.1109/SOI.1997.634969
Filename :
634969
Link To Document :
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