Title :
Towards understanding of VOC decomposition mechanisms using nonthermal plasmas
Author :
Futamura, Shigeru ; Yamamoto, Toshiaki ; Lawless, Phil A.
Author_Institution :
Nat. Inst. for Resources & Environ., Ibaraki, Japan
Abstract :
Plasma chemical reactions of trichloroethylene (TCE), alkyl acetates and butane were carried out with pulsed corona and packed-bed reactors in order to get insight into the effects of reactor geometry, input energy and background atmosphere on the VOC (volatile organic compounds) reactivities. Extremely high decomposition efficiency of TCE was obtained in nitrogen, and under aerated conditions, byproduct formation was suppressed. Water depressed TCE decomposition efficiency. The initial step of plasma chemical decomposition of TCE can be ascribed to the electron attachment followed by homolysis and/or heterolysis. As for alkyl acetate decomposition, its decomposition efficiency was affected by reactor geometry and alkyl chain length. Comparable decomposition efficiencies of butane were obtained as for butyl acetate under the similar conditions, suggesting the plausible decomposition of the alkyl moiety in the alkyl acetates
Keywords :
chemical reactions; corona; electron attachment; organic compounds; plasma applications; plasma collision processes; aerated conditions; alkyl acetates; alkyl chain length; alkyl moiety; background atmosphere; butane; decomposition efficiency; decomposition mechanisms; electron attachment; heterolysis; homolysis; input energy; nitrogen; nonthermal plasmas; packed-bed reactors; plasma chemical decomposition; plasma chemical reactions; pulsed corona; reactor geometry; trichloroethylene; volatile organic compounds decomposition; Atmosphere; Chemical compounds; Chemical reactors; Corona; Geometry; Inductors; Nitrogen; Organic chemicals; Plasma chemistry; Volatile organic compounds;
Conference_Titel :
Industry Applications Conference, 1995. Thirtieth IAS Annual Meeting, IAS '95., Conference Record of the 1995 IEEE
Conference_Location :
Orlando, FL
Print_ISBN :
0-7803-3008-0
DOI :
10.1109/IAS.1995.530473