Title :
Reflection ellipsometry for in-situ measurements of complex permittivity and thickness of a single-layer material at microwave frequencies : theory and experiments
Author :
Sagnard, F. ; Seetharamdoo, D. ; Vignat, C.
Author_Institution :
Laboratoire Systÿmes de Communication, Université de Marne-La-Vallée, 5, Bd Descartes, Champs-sur-Marne, 77454 Marne-La-Vallée Cedex 02, France. email: sagnard@univ-mlv.fr
Abstract :
For in-situ measurement of the complex permittivity of planar materials, we have developed a free-space experimental setup based on reflection ellipsometry and extended to microwave frequencies. Different angles of incidence were studied in the range [35 ; 50°]. Original numerical methods, derived from analytical relations based on contour line charts and least-square optimization, allow to highlight the influence of measurement uncertainties. Novel developments concerning the simultaneous determination of both complex permittivity and thickness of a single-layer sample are shown.
Keywords :
Argon; Dielectric materials; Ellipsometry; Frequency measurement; Measurement uncertainty; Microwave frequencies; Microwave measurements; Optical reflection; Permittivity measurement; Thickness measurement;
Conference_Titel :
Microwave Conference, 2002. 32nd European
Conference_Location :
Milan, Italy
DOI :
10.1109/EUMA.2002.339414