DocumentCode :
2174471
Title :
Microwave noise characteristics of InP-based high electron mobility transistors with InGaAs channel and InGaAs/InP composite channel: a comparative study
Author :
Liu, Yuwei ; Wang, Hong ; Zeng, Rong
Author_Institution :
Microelectron. Centre, Nanyang Technol. Univ.
fYear :
2005
fDate :
8-12 May 2005
Firstpage :
437
Lastpage :
439
Abstract :
A comparative study of the microwave noise performance between InP high electron mobility transistors (HEMTs) with InGaAs channel and InGaAs/InP composite channel is performed. Detailed microwave noise characteristics of InP-based HEMT with single channel and composite channel are presented. A model is carried out to extract the noise parameters and study the thermal noise performance of InP-based HEMT. Characterization of noise performance of InGaAs/InP composite channel HEMTs reveals a different bias dependence of NFmin compared to conventional single InGaAs channel devices. The composite channel HEMT shows a lower NFmin at high Vd with a relatively weak Vd dependence. This could be explained under the framework of suppression channel thermal noise due to the electron transfer from InGaAs channel to InP subchannel at high Vd
Keywords :
III-V semiconductors; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor device noise; InGaAs-InP; InGaAs-InP composite channel; InP-based high electron mobility transistors; electron transfer; microwave noise characteristics; Electron mobility; Frequency; HEMTs; Indium compounds; Indium gallium arsenide; Indium phosphide; MODFETs; Microwave devices; Microwave transistors; Semiconductor device noise;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 2005. International Conference on
Conference_Location :
Glasgow, Scotland
ISSN :
1092-8669
Print_ISBN :
0-7803-8891-7
Type :
conf
DOI :
10.1109/ICIPRM.2005.1517524
Filename :
1517524
Link To Document :
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