DocumentCode :
2182608
Title :
Wafer-level chip-to-Wafer (C2W) integration of high-sensitivity MEMS and ICs
Author :
Xu, Gaowei ; Yan, Peili ; Chen, Xiao ; Ning, Wenguo ; Luo, Le ; Jiao, Jiwei
Author_Institution :
Shanghai Inst. of Microsyst. & Inf. Technol., Shanghai, China
fYear :
2011
fDate :
8-11 Aug. 2011
Firstpage :
1
Lastpage :
5
Abstract :
A new kind of 3D wafer-level (WL) hybrid integration technology, i.e. Chip-to-Wafer (C2W) approach was developed for high sensitivity Micro-electro-mechanical systems (MEMS) system. The corresponding technical process flows were designed, and corresponding experiments were conducted. Glass frit bonding method was used to bond the MEMS device wafer with silicon coverplate wafer, and the WL hermetic/vacuum seal was fulfilled. Bare dies (e.g. ASIC etc) were stacked on patterned coverplate by chip-to-Wafer approach. Wirebonding method was used for the multilayer I/O interconnection of MEMS and IC. "Dam & Fill" method was used for the capsulation of MEMS system. Finally, 3D-WL hybrid integration of MEMS device wafer and ASIC was realized. The quality factor Q of MEMS device measured after vacuum packaging reached to 577.41, compared to 301.9 of no vacuum packaging. It turned out that glass frit wafer bonding allows hermetic sealing and a high process yield. In order to obtain low-stress microsystem package, simulation was also completed to investigate the stress of MEMS system package, the effects of the thermo-mechanical properties and curing properties of the encapsulating materials on the microsystem package stress were also studied. It turned out that the "dam and fill" approach is an effective way to decrease the stress of the package of high sensitivity MEMS system package.
Keywords :
application specific integrated circuits; curing; hermetic seals; hybrid integrated circuits; integrated circuit interconnections; lead bonding; micromechanical devices; wafer bonding; wafer level packaging; 3D WL hybrid integration technology; 3D wafer-level hybrid integration technology; ASIC; C2W approach; MEMS system; WL hermetic-vacuum seal; chip-to-wafer approach; coverplate wafer; curing property; dam & fill method; encapsulating material; glass frit bonding method; hermetic sealing; low-stress microsystem packaging; microelectromechanical system system; multilayer I-O interconnection; quality factor Q; thermomechanical property; vacuum packaging; wirebonding method; Curing; Encapsulation; Glass; Micromechanical devices; Stress; Substrates; 3D hybrid integration; Chip-to-Wafer (C2W); Micro-electromechanical systems (MEMS); dam and fill; glass frit hermetic bonding; low-stress encapsulation microsystem package; wafer-level package (WLP);
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Packaging Technology and High Density Packaging (ICEPT-HDP), 2011 12th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4577-1770-3
Electronic_ISBN :
978-1-4577-1768-0
Type :
conf
DOI :
10.1109/ICEPT.2011.6066804
Filename :
6066804
Link To Document :
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