• DocumentCode
    2183643
  • Title

    The study on the shaping of electroplated copper pillar bumping

  • Author

    Han, Ying ; Li, Ming ; Sun, Hongqi ; Sun, Jiangyan

  • Author_Institution
    State Key Lab. of Metal Matrix Composites, Shanghai Jiao Tong Univ., Shanghai, China
  • fYear
    2011
  • fDate
    8-11 Aug. 2011
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    With the increasing connection density of ICs, the technology of flip chip packaging and stacked-die packaging bounded by bumping are gradually replacing the traditional wire bonding to become one of the main styles of the package. And as one of the critical technology the technology of electroplating copper pillar wins more and more concern. This paper concerns about the influence of the electroplating additives which includes accelerator, leveler and the density of electroplating current to the forming of copper pillar. And by adjusting the quantity of the additives and the density of electroplating current, we got the satisfactory copper pillar with the smooth surface.
  • Keywords
    copper; electronics packaging; electroplated coatings; flip-chip devices; Cu; connection density; electroplated copper pillar bumping; electroplating copper pillar; flip chip packaging; stacked-die packaging; wire bonding; Copper; Current density; Morphology; Packaging; Scanning electron microscopy; Surface morphology; Surface topography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Packaging Technology and High Density Packaging (ICEPT-HDP), 2011 12th International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4577-1770-3
  • Electronic_ISBN
    978-1-4577-1768-0
  • Type

    conf

  • DOI
    10.1109/ICEPT.2011.6066842
  • Filename
    6066842