DocumentCode
2183643
Title
The study on the shaping of electroplated copper pillar bumping
Author
Han, Ying ; Li, Ming ; Sun, Hongqi ; Sun, Jiangyan
Author_Institution
State Key Lab. of Metal Matrix Composites, Shanghai Jiao Tong Univ., Shanghai, China
fYear
2011
fDate
8-11 Aug. 2011
Firstpage
1
Lastpage
4
Abstract
With the increasing connection density of ICs, the technology of flip chip packaging and stacked-die packaging bounded by bumping are gradually replacing the traditional wire bonding to become one of the main styles of the package. And as one of the critical technology the technology of electroplating copper pillar wins more and more concern. This paper concerns about the influence of the electroplating additives which includes accelerator, leveler and the density of electroplating current to the forming of copper pillar. And by adjusting the quantity of the additives and the density of electroplating current, we got the satisfactory copper pillar with the smooth surface.
Keywords
copper; electronics packaging; electroplated coatings; flip-chip devices; Cu; connection density; electroplated copper pillar bumping; electroplating copper pillar; flip chip packaging; stacked-die packaging; wire bonding; Copper; Current density; Morphology; Packaging; Scanning electron microscopy; Surface morphology; Surface topography;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Packaging Technology and High Density Packaging (ICEPT-HDP), 2011 12th International Conference on
Conference_Location
Shanghai
Print_ISBN
978-1-4577-1770-3
Electronic_ISBN
978-1-4577-1768-0
Type
conf
DOI
10.1109/ICEPT.2011.6066842
Filename
6066842
Link To Document