Title :
Update on crystal lattice measurements at NIST
Author :
Deslattes, R.D. ; Kessler, E.G., Jr.
Author_Institution :
Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
fDate :
June 27 1994-July 1 1994
Abstract :
The NIST crystal lattice measurements include the lattice period measurement of a silicon sample using optical interferometry (XROI) and a lattice comparison facility using Laue diffraction (delta-d). Crystals validated by these measurements are used in angle measuring spectrometers to produce X-ray and gamma-ray standards. This summary describes progress and problems in both the XROI and delta-d measurements and presents lattice comparison results for seven samples destined for X-ray and gamma-ray diffraction measurements.<>
Keywords :
X-ray applications; angular measurement; elemental semiconductors; gamma-ray applications; lattice constants; light interferometry; measurement standards; silicon; Laue diffraction; NIST; Si; X-ray diffraction measurement; X-ray standards; angle measuring spectrometers; crystal lattice measurement; delta-d measurement; gamma-ray diffraction measurement; gamma-ray standards; lattice period measurement; optical interferometry; Crystals; Goniometers; Lattices; Measurement standards; NIST; Optical diffraction; Optical interferometry; Silicon; Spectroscopy; X-ray diffraction;
Conference_Titel :
Precision Electromagnetic Measurements, 1994. Digest., 1994 Conference on
Conference_Location :
Boulder, CO, USA
Print_ISBN :
0-7803-1984-2
DOI :
10.1109/CPEM.1994.333370
