DocumentCode :
2186325
Title :
The silicon (220) lattice spacing: analysis of a new measurement
Author :
Basile, G. ; Bergamin, A. ; Cavagnero, G. ; Mana, G. ; Vittone, E. ; Zosi, G.
Author_Institution :
Istituto di Metrol. G. Colonnetti, CNR, Torino, Italy
fYear :
1994
fDate :
June 27 1994-July 1 1994
Firstpage :
337
Lastpage :
338
Abstract :
A new experiment has been run for the past year at the IMGC to measure the (220) lattice spacing in silicon by X-ray/optical/interferometry. The data so far collected show that the experiment is capable of 5/spl times/10/sup -9/ resolution. A new determination of silicon d/sub 220/ is reported.<>
Keywords :
X-ray applications; lattice constants; light interferometry; silicon; Si; X-ray interferometry; d/sub 220/ constant; optical interferometry; semiconductor materials; Atom optics; Displacement measurement; Error correction; Lattices; Nanotechnology; Neutrons; Optical feedback; Optical interferometry; Optical noise; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Precision Electromagnetic Measurements, 1994. Digest., 1994 Conference on
Conference_Location :
Boulder, CO, USA
Print_ISBN :
0-7803-1984-2
Type :
conf
DOI :
10.1109/CPEM.1994.333371
Filename :
333371
Link To Document :
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