Title :
Synchrotron radiation masking on asymmetric 6.5 x 4.3-GeV B-Factory
Author :
Blinov, V.E. ; Lebedev, V.A. ; Matveev, A.V. ; Tayursky, V.A. ; Zholents, A.A.
Author_Institution :
Inst. of Nucl. Phys., Novosibirsk, USSR
Abstract :
Synchrotron radiation background rate was investigated in the recently proposed project of the asymmetric 6.5-GeV*4.3-GeV B-factory with monochromization. The method used was Monte Carlo simulations of the absorption and reradiation of photons in the primary masks, secondary mask-shaded primary masks, and so on. With the proposed mask scheme, an acceptable background level in the silicon vertex chamber of about 8*10/sup 6/ photons/s was obtained.<>
Keywords :
Monte Carlo methods; beam handling equipment; beam handling techniques; synchrotron radiation; Monte Carlo simulations; Si vertex chamber; absorption; asymmetric 6.5*4.3-GeV B-Factory; background level; monochromization; photons; primary masks; reradiation; secondary mask-shaded primary masks; synchrotron radiation masking; Absorption; Heating; Lenses; Magnetic fields; Magnets; Nuclear physics; Proposals; Silicon; Strontium; Synchrotron radiation;
Conference_Titel :
Particle Accelerator Conference, 1991. Accelerator Science and Technology., Conference Record of the 1991 IEEE
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-0135-8
DOI :
10.1109/PAC.1991.164960
