Title :
Simulation-based nonlinear filtering with redundant observations and bounded disturbances
Author :
Lee, Ji-Woong ; Khargonekar, Pramod P.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
Abstract :
This paper proposes a nonlinear filtering algorithm for unknown dynamics and high-complexity observations. We show that the algorithm yields bounded error under redundant observations and small bounded disturbances. The algorithm is a generalization of what we have used to achieve the first reported real-time estimation of submicron patterned wafer geometries during a plasma etching process with spectral reflectometry
Keywords :
filtering theory; observability; process control; real-time systems; reflectometry; semiconductor device manufacture; sputter etching; state estimation; bounded disturbances; nonlinear filtering; plasma etching process; real-time systems; redundant observations; semiconductor device manufacture; spectral reflectometry; state estimation; submicron wafer geometries; Computational modeling; Etching; Filtering algorithms; Nonlinear optics; Optical feedback; Optical filters; Optical scattering; Plasma applications; Semiconductor device modeling; Semiconductor process modeling;
Conference_Titel :
Decision and Control, 2001. Proceedings of the 40th IEEE Conference on
Conference_Location :
Orlando, FL
Print_ISBN :
0-7803-7061-9
DOI :
10.1109/.2001.980567
