Title :
Freeform lens design for uniform illumination with extended source
Author :
Wu, Dan ; Wang, Kai ; Liu, Sheng
Author_Institution :
Div. of MOEMS, Huazhong Univ. of Sci. & Technol., Wuhan, China
Abstract :
Nonuniform illumination caused by extended source is one of the challenging points for high power Light-emitting diodes (LEDs) especially for LED array applications. A new design method to improve the uniformity of illuminance of extended source is presented. To obtain high uniformity at target plane, a feedback optimization method is introduced including target plane girds, light source girds and target plane and light source girds optimization algorithms. Monte Carlo ray tracing simulation results demonstrate that our feedback optimization algorithms are able to obviously increase the uniformity of illuminance at target plane. The uniformity increases from 0.53 to 0.9, 0.77 and 0.88 by our three different optimization algorithms respectively. This method would be a potential way in improving the uniformity of illuminance at target plane with little light pattern expansion.
Keywords :
Monte Carlo methods; electronics packaging; light emitting diodes; optimisation; LED array applications; extended source; feedback optimization method; freeform lens design; high power Light-emitting diodes; light pattern expansion; light source girds; source gird optimization algorithms; target plane girds; uniform illumination; Lenses; Light emitting diodes; Light sources; Lighting; Optimization; Packaging; Simulation;
Conference_Titel :
Electronic Packaging Technology and High Density Packaging (ICEPT-HDP), 2011 12th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4577-1770-3
Electronic_ISBN :
978-1-4577-1768-0
DOI :
10.1109/ICEPT.2011.6067016