DocumentCode :
2189159
Title :
Simulation of quantum and scattering effects along the channel of ultra-scaled Si-based MOSFETs
Author :
Wanqiang Chen ; Register, L.F. ; Banerjee, S.K.
Author_Institution :
Microelectron. Res. Center, Texas Univ., Austin, TX, USA
fYear :
2002
fDate :
24-26 June 2002
Firstpage :
109
Lastpage :
110
Abstract :
As the dimensions of MOSFETs scale into deep sub-0.1 /spl mu/m, a clear understanding of both the effects of scattering and quantum interference is needed. In this work, the quantum transport simulator "Schrodinger Equation Monte Carlo" (SEMC) (L.F. Register, in Quantum-Based Electronic Devices and Systems, M. Dutta and M.A. Stroscio, eds., World Scientific, Singapore, p. 251, 1998) is used to examine the effects of scattering and quantum interference along the channel. The simulation results suggest that not only does scattering, and the modeling thereof, remain critical even for 10 nm devices, but the detailed nature of the scattering - elastic, inelastic, etc. - remains important.
Keywords :
MOSFET; Monte Carlo methods; Schrodinger equation; impurity scattering; nanoelectronics; quantum interference phenomena; semiconductor device models; surface scattering; 10 nm; MOSFET dimensions; Schrodinger Equation Monte Carlo quantum transport simulator; Si; elastic scattering; impurity scattering; inelastic scattering; modeling; quantum effects; quantum interference effects; scattering effects; simulation; surface roughness scattering; ultra-scaled Si-based MOSFET channel; Analytical models; Equations; Germanium silicon alloys; Interference; MOSFET circuits; Microelectronics; Optical reflection; Optical scattering; Particle scattering; Silicon germanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2002. 60th DRC. Conference Digest
Conference_Location :
Santa Barbara, CA, USA
Print_ISBN :
0-7803-7317-0
Type :
conf
DOI :
10.1109/DRC.2002.1029539
Filename :
1029539
Link To Document :
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