Domain decomposition method for electromagnetic scattering problems: application to EUV lithography

Author

Zschiedrich, Lin ; Burger, Sven ; Schadle, Achim ; Schmidt, Frank

Author_Institution

Zuse Inst., Berlin, Germany

fYear

2005

fDate

19-22 Sept. 2005

Firstpage

55

Lastpage

56

Abstract

We present a domain decomposition approach for the computation of the electromagnetic field within a EUV lithography line mask. We use an additive Schwarz method with transparent boundary conditions at the interfaces of the domains. Light propagation within the multi-layer stack of the EUV mask is treated analytically. This results in a dramatical reduction of the computational costs and allows for the simulation of next generation lithography masks on a standard personal computer.

Keywords

Helmholtz equations; convergence; electromagnetic fields; electromagnetic wave scattering; finite element analysis; light propagation; masks; optical multilayers; ultraviolet lithography; EUV lithography line mask; additive Schwarz method; domain decomposition method; electromagnetic scattering; light propagation; multilayer stack; transparent boundary condition; Additives; Boundary conditions; Computational efficiency; Computational modeling; Computer simulation; Electromagnetic fields; Electromagnetic propagation; Electromagnetic scattering; Lithography; Optical propagation;

fLanguage

English

Publisher

ieee

Conference_Titel

Numerical Simulation of Optoelectronic Devices, 2005. NUSOD '05. Proceedings of the 5th International Conference on

Print_ISBN

0-7803-9149-7

Type

conf

DOI

10.1109/NUSOD.2005.1518132

Filename

1518132