DocumentCode :
2190168
Title :
Suppression of drain conductance frequency dispersion in InP-based HEMTs by eliminating hole accumulation
Author :
Arai, T. ; Sawada, K. ; Okamoto, N. ; Makiyama, K. ; Takahashi, T. ; Hara, N.
Author_Institution :
Fujitsu Labs. Ltd., Kanagawa, Japan
fYear :
2002
fDate :
24-26 June 2002
Firstpage :
167
Lastpage :
168
Abstract :
InP-based HEMTs are promising devices for large-capacity optical fiber communication systems. To enable higher bit rate systems, though, drain conductance (g/sub d/) frequency dispersion must be suppressed as it causes jitter, which reduces the size of eye pattern openings in integrated circuits. We propose a planar structure device to remarkably suppress g/sub d/ frequency dispersion by eliminating hole accumulation at the extrinsic source. The band-discontinuity between the source contact and the channel was eliminated by direct ohmic contact, which increased the flow of holes to the source contact.
Keywords :
III-V semiconductors; electric admittance; high electron mobility transistors; indium compounds; ohmic contacts; semiconductor device models; InGaAs-InAlAs-InP; InP; InP-based HEMTs; Ni-AuGe-Au; RF characteristics; band-discontinuity elimination; direct ohmic contact; drain conductance frequency dispersion suppression; high bit rate systems; hole accumulation elimination; jitter; optical fiber communication systems; planar structure device; Bit rate; Capacitance; HEMTs; Impact ionization; Laboratories; MODFETs; Ohmic contacts; Optical fiber communication; Optical fiber dispersion; Radio frequency;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2002. 60th DRC. Conference Digest
Conference_Location :
Santa Barbara, CA, USA
Print_ISBN :
0-7803-7317-0
Type :
conf
DOI :
10.1109/DRC.2002.1029578
Filename :
1029578
Link To Document :
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