DocumentCode
2192171
Title
Irregular growth of PECVD-Ti silicide film on doped Si substrates
Author
Tai, Kaori ; Harada, Yusuke ; Matsumoto, Muneyuki ; Oki, Hisanori
Author_Institution
LSI Production Division, Oki Electric Industry Co., Ltd., Tokyo, Japan
fYear
2000
fDate
2000
Firstpage
64
Lastpage
66
Keywords
Chemical industry; Large scale integration; Production; Scanning electron microscopy; Semiconductor films; Silicides; Sputtering; Substrates; Surface morphology; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Interconnect Technology Conference, 2000. Proceedings of the IEEE 2000 International
Print_ISBN
0-7803-6327-2
Type
conf
DOI
10.1109/IITC.2000.854283
Filename
854283
Link To Document