مرکز منطقه ای اطلاع رساني علوم و فناوري - Integration of low-k spin-on polymer and Cu for Damascene

DocumentCode :

2192285

Title :

Integration of low-k spin-on polymer and Cu for Damascene

Author :

Chang, W. ; Chiou, W.C. ; Li, L.J. ; Chao, L.C. ; Jang, S.M. ; Yu, C.H. ; Liang, M.S.

Author_Institution :

Taiwan Semiconductor Manufacturing Company

fYear :

2000

fDate :

2000

Keywords :

CMOS technology; Capacitance; Coatings; Etching; Polymers; Resists; Solvents; Surface treatment; Testing; Thermal resistance;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Interconnect Technology Conference, 2000. Proceedings of the IEEE 2000 International

Print_ISBN :

0-7803-6327-2

Type :

conf

DOI :

10.1109/IITC.2000.854288

Filename :

854288

Link To Document :