DocumentCode
2193416
Title
A study on edge termination technique at low temperature for high voltage IGBT
Author
Saitoh, Ryu ; Yoshino, Masao ; Otsuki, Masahito ; Sukurai, K.
Author_Institution
Matsumoto Factory, Fuji Electr. Co. Ltd., Nagano, Japan
fYear
1996
fDate
20-23 May 1996
Firstpage
227
Lastpage
230
Abstract
By a simulation study and advanced process technologies, the edge termination structure has been modified for a high power electronic industrial applications and traction. In the rail traction application, the power devices may be subjected to both high voltage and high current at a relative low ambient temperature. In this field, a specified maximum blocking voltage is strongly requested even at the low ambient temperature of -40°C. The temperature dependence of the blocking voltage is strongly dependent on the edge termination structure. We developed a high voltage IGBT having a lower temperature dependence of the blocking voltage, which has an edge termination with a semi-resistive film over field limiting rings with the offset field plates. This technology will spread the application field of IGBT toward higher voltages and more demanding operating conditions
Keywords
electric breakdown; insulated gate bipolar transistors; power transistors; -40 C; 1800 V; 2500 V; HV device; edge termination technique; field limiting rings; high voltage IGBT; low temperature operation; maximum blocking voltage; offset field plates; rail traction applications; semi-resistive film; temperature dependence; Electronics industry; Insulated gate bipolar transistors; Low voltage; Metalworking machines; Power electronics; Production facilities; Rails; Snubbers; Temperature dependence; Thyristors;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Semiconductor Devices and ICs, 1996. ISPSD '96 Proceedings., 8th International Symposium on
Conference_Location
Maui, HI
ISSN
1063-6854
Print_ISBN
0-7803-3106-0
Type
conf
DOI
10.1109/ISPSD.1996.509487
Filename
509487
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