Title :
IDDQ Test Challenges in Nanotechnologies: A Manufacturing Test Strategy
Author :
Yu WeiP´ng ; Lee, Moo Kit ; Ng, Peng Weng ; Ong, Chin Hu
Author_Institution :
Marvell Semicond., Sunnyvale
Abstract :
The implementation of IDDQ test is increasingly challenging with the shrinking of process geometry in nanotechnologies. This paper presents a case study of the test challenges that the industry is facing in deep submicron process. An IDDQ manufacturing test strategy is discussed to address the challenges.
Keywords :
integrated circuit testing; leakage currents; nanoelectronics; IC manufacturing test strategy; IDDQ test challenge; integrated circuit testing; leakage current; nanotechnology; semiconductor fabrication process; submicron process; Automatic testing; Current measurement; Geometry; Leakage current; Loss measurement; Manufacturing industries; Manufacturing processes; Production; Semiconductor device manufacture; Very large scale integration;
Conference_Titel :
Asian Test Symposium, 2007. ATS '07. 16th
Conference_Location :
Beijing
Print_ISBN :
978-0-7695-2890-8
DOI :
10.1109/ATS.2007.36
