Title :
Spectroscopic studies of high-pressure microhollow cathode discharge plasmas in Ne/H/sub 2/ and Ne/N/sub 2/ mixtures
Author :
Kurunczi, P. ; Becker, Kurt
Author_Institution :
Dept. of Phys., Stevens Inst. of Technol., Hoboken, NJ, USA
Abstract :
Summary form only given. We have studied mixtures of high-pressure Ne with traces of N/sub 2/ and observed intense atomic N emissions at 113.4 nm and 120.0 nm. The microscopic processes leading to the N emissions are more complicated than those responsible for the H emissions and may involve the formation of metastable N/sub 2/*(A) molecules as intermediate species. We are carrying out a series of DC and time-resolved spectroscopic studies of the visible N/sub 2/ (2/sup nd/ positive system) and N/sub 2//sup +/ (1/sup st/ negative system) emissions and the atomic N lines at 113.4 nm and 120.0 nm to (i) characterize the plasma properties (rotational, vibrational, electron temperatures) and to (ii) elucidate the underlying process(es) leading to the emission of the atomic N lines and their time scale(s).
Keywords :
gas mixtures; glow discharges; hydrogen; neon; nitrogen; plasma diagnostics; 113.4 nm; 120.0 nm; 1st negative system; 2nd positive system; DC studies; N/sub 2//sup +/ emissions; Ne-H/sub 2/; Ne-H/sub 2/ mixtures; Ne-N/sub 2/; Ne-N/sub 2/ mixtures; UV spectra; atomic N lines; electron temperatures; high-pressure Ne; high-pressure microhollow cathode discharge plasmas; intense atomic N emissions; intermediate species; metastable N/sub 2/*(A) molecules; microscopic processes; plasma properties; rotational temperatures; spectroscopic studies; time scale; time-resolved spectroscopy; vibrational temperatures; visible N/sub 2/ emissions; Atmospheric-pressure plasmas; Atomic measurements; Cathodes; Fault location; Hydrogen; Physics; Plasma applications; Plasma sources; Plasma waves; Spectroscopy;
Conference_Titel :
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location :
New Orleans, LA, USA
Print_ISBN :
0-7803-5982-8
DOI :
10.1109/PLASMA.2000.854547