• DocumentCode
    2200264
  • Title

    Particle-in-cell simulation of plasma immersion ion implantation (PIII) of industrial gears

  • Author

    Kwok, Dixon Tat Kun ; Chu, Paul K.

  • Author_Institution
    Dept. of Phys. & Mater. Sci., City Univ. of Hong Kong, Kowloon, China
  • fYear
    2000
  • fDate
    4-7 June 2000
  • Firstpage
    100
  • Abstract
    Summary form only given. Plasma immersion ion implantation (PIII) has emulates conventional beam-line ion implantation in that the implantation time is independent of the sample size and large industrial components of an irregular shape can be treated relatively easily due to its non-line-of-sight characteristic. For example, due to the non-planar and periodic structure of industrial gears, conventional deposition and beam-line treatment techniques are not easily implemented. In addition, as they are used in space, typically as a component in a satellite, conventional coatings may not function desirably either, and PIII is the ideal technique in this case. In this work, we employ a theoretical model to investigate the PIII process of this important industrial component. To simulate implantation into the three-dimensional structure of a commercial gear, we work in cylindrical coordinates. Due to the periodic structure of the saw-teeth, we only need to simulate the volume of one tooth. 2D simulation along the (r-0) plane is carried out by the particle-in-cell (PIC) method. The incident dose and impact angle along the surface of the tooth are derived and our results indicate that a long implantation pulse will implant more ions at the bottom of the tooth at normal angle since the momentum of the incoming ions accelerated at the middle and end period of the pulse will overcome the attractive force from the sidewall of the tooth. Therefore, shorter pulse duration will implant the whole surface of the tooth more uniformly. We will also provide an estimation on the preferred pulse duration for different tooth dimensions.
  • Keywords
    ion implantation; plasma materials processing; plasma simulation; (r-0) plane; 2D simulation; attractive force; beam-line ion implantation; beam-line treatment; commercial gear; deposition; impact angle; implantation pulse; incident dose; industrial components; industrial gears; ion acceleration; irregular shape; nonplanar structure; particle-in-cell method; particle-in-cell simulation; periodic structure; plasma immersion ion implantation; plasma simulation; pulse duration; sample size; saw tooth dimensions; saw-teeth; three-dimensional structure; Coatings; Gears; Implants; Ion implantation; Periodic structures; Plasma immersion ion implantation; Plasma simulation; Satellites; Shape; Teeth;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
  • Conference_Location
    New Orleans, LA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5982-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.2000.854642
  • Filename
    854642