• DocumentCode
    2200324
  • Title

    Skin Response During Irradiation by Intense Pulsed Light Based on Optical Imaging Technology and Histology

  • Author

    Wu Shu-lian ; Li Hui ; Xiao Zheng-ying ; Li Zhi-fang

  • Author_Institution
    Key Lab. of Optoelectron. Sci. & Technol. for Med., Fujian Normal Univ., Fuzhou, China
  • fYear
    2009
  • fDate
    17-19 Oct. 2009
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Nonablative light is a novel light source such as intense pulsed light (IPL) treatment for skin disease. The clinical objective of it is to maximize thermal damage to upper dermis while minimizing injury to the epidermis and to decrease potential complications. But many the complications also exist in the clinic. In this study, we developed a new approach to monitor the response of skin tissue irradiated by IPL and measured the attenuation coefficient between the change of the tissue optical properties utilizing fiber based on optical coherence tomography (OCT) technology and conventional histology. OCT is a well-established optical imaging technique that uses low coherence interferometry to produce micrometer-scale resolution images of biological media. The outcome shows that the attenuation coefficient increase after irradiated and then gradually reduces with times; the changes of the total attenuation coefficient increase with the dose.
  • Keywords
    bio-optics; biomedical optical imaging; biothermics; diseases; light interferometry; optical tomography; patient treatment; skin; OCT technology; attenuation coefficient; biological media; epidermal injury; histology; intense pulsed light irradiation; low coherence interferometry; optical coherence tomography; optical imaging technology; skin disease treatment; skin response; thermal damage; Biomedical optical imaging; Dermis; Diseases; Injuries; Light sources; Optical attenuators; Optical imaging; Optical interferometry; Optical pulses; Skin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Biomedical Engineering and Informatics, 2009. BMEI '09. 2nd International Conference on
  • Conference_Location
    Tianjin
  • Print_ISBN
    978-1-4244-4132-7
  • Electronic_ISBN
    978-1-4244-4134-1
  • Type

    conf

  • DOI
    10.1109/BMEI.2009.5305767
  • Filename
    5305767