• DocumentCode
    2200387
  • Title

    Modeling of transient effects in resonant discharges

  • Author

    Bowers, K.J. ; Qiu, Wei

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
  • fYear
    2000
  • fDate
    4-7 June 2000
  • Firstpage
    101
  • Abstract
    Summary form only given. In a resonantly sustained discharge, a plasma is maintained with an RF field driven at the series resonance-the frequency at which the capacitive sheaths of the plasma resonate with the inductive bulk. Such a discharge has many unique properties including resistive V-I characteristics (V-I phase difference near zero), scaling laws (density is proportional to the cube of the drive frequency) and heating mechanisms (strongly kinetic). A simplified model of the discharge is being developed to explain these transient effects. The model is an extension of the homogeneous model used for calculation of discharge steady state parameters given by Lichtenberg and Lieberman (1994). Initial results look promising-giving qualitative agreement with the some effects discussed above. The model results will be compared with simulations and experiments.
  • Keywords
    discharges (electric); plasma sheaths; plasma simulation; plasma temperature; RF field; capacitive sheaths; discharge steady state parameters; drive frequency; frequency; heating mechanisms; homogeneous model; phase difference; resistive V-I characteristics; resonant discharges; resonantly sustained discharge; resonating plasma; scaling laws; series resonance; transient effects; Drives; Heating; Kinetic theory; Mechanical factors; Plasma density; Plasma properties; Plasma sheaths; Radio frequency; Resonance; Resonant frequency;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
  • Conference_Location
    New Orleans, LA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5982-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.2000.854647
  • Filename
    854647