DocumentCode
2201736
Title
On the use of the resistive barrier discharge to kill bacteria: recent results
Author
Richardson, J.P. ; Dyer, F.F. ; Dobbs, F.C. ; Alexeff, I. ; Laroussi, M.
Author_Institution
Old Dominion Univ., Norfolk, VA, USA
fYear
2000
fDate
4-7 June 2000
Firstpage
109
Abstract
Summary form only given, as follows. Large volume, atmospheric pressure, low-temperature plasmas have been shown to be effective biological and chemical decontamination devices. However, most of the discharges use RF power sources capable of generating high voltages at relatively high frequencies. Such sources are not only expensive, but they radiate power which can potentially affect sensitive electronics located in their surroundings. In order to solve these cost and technical drawbacks, Alexeff, Laroussi, and co-workers (1999) introduced the resistive barrier discharge (RBD) which uses either DC or quasi-DC (60 Hz) sources. With an input power less than 1 kW, and helium as a carrier gas, the RBD is capable of generating a few liters of low-temperature plasma, at atmospheric pressure. Recent work by Laroussi, Dobbs, and co-workers has demonstrated that the plasma generated by the RBD decreases viability (estimated by cultural techniques) of bacteria In this paper, in addition to reporting on the germicidal potential of the RBD, an attempt to identify some of its biochemical impact on bacterial cells will be made.
Keywords
biological effects of radiation; high-frequency discharges; microorganisms; plasma applications; 1 kW; 60 kHz; DC sources; He carrier gas; RF power sources; atmospheric pressure; bacteria; bacterial cells; biological decontamination; chemical decontamination; electronics; germicidal potential; large volume atmospheric pressure low-temperature plasmas; quasi-DC sources; resistive barrier discharge; Atmospheric-pressure plasmas; Chemicals; Decontamination; Fault location; Microorganisms; Plasma chemistry; Plasma devices; Plasma sources; Power generation; Radio frequency;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location
New Orleans, LA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5982-8
Type
conf
DOI
10.1109/PLASMA.2000.854710
Filename
854710
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