Title :
Enthalpy and heat flux distributions in a triple torch plasma reactor
Author :
Hyundae Kim ; Hancun Chen ; Heberlein, J.
Author_Institution :
High Temp. & Plasma Lab., Minnesota Univ., Minneapolis, MN, USA
Abstract :
Summary form only given. In thermal plasma deposition, the precursor materials are injected into the plasma and transported by a plasma jet to the substrate. The strong non-uniformities of the plasma jet and of the distribution of the deposition precursors can lead to nonuniformities in the coating properties. The triple torch plasma reactor has been designed to alleviate this situation and offers an increased plasma volume by arranging three plasma torches in such a way that their jets coalesce. The deposition precursors are injected through a water-cooled probe into the region where the jets combine. In order to get an understanding of the interaction between the plasma and the deposition precursors as well as between the plasma and the substrate, the enthalpy flux and heat flux distributions in the reactor have been measured. A watercooled miniature enthalpy probe has been used, in conjunction with a novel miniature heat flux probe embedded in the substrate. Data have been obtained for different torch currents (250 and 300 A per torch), for different chamber pressures (100 to 600 Torr), and for different injectant carrier gas flow rates. An analysis for the substrate heat flux based on regular stagnation flow heat transfer has yielded results which are in acceptable agreement with the experimental data for the case of 600 Torr chamber pressure, but display significant discrepancies for a pressure of 300 Torr. Non-equilibrium effects appear to reduce the substrate heat flux.
Keywords :
enthalpy; plasma deposition; plasma jets; plasma pressure; plasma temperature; plasma torches; chamber pressures; coating properties; deposition precursors; enthalpy distributions; enthalpy flux; heat flux distributions; injectant carrier gas flow rates; jet coalescence; miniature heat flux probe; nonequilibrium effects; nonuniformities; plasma jet; plasma torches; plasma volume; plasma-deposition precursor interactions; plasma-substrate interactions; precursor materials; stagnation flow heat transfer; substrate heat flux; thermal plasma deposition; torch currents; triple torch plasma reactor; water-cooled probe; watercooled miniature enthalpy probe; Coatings; Fluid flow; Heat transfer; Inductors; Plasma materials processing; Plasma measurements; Plasma properties; Plasma transport processes; Probes; Water heating;
Conference_Titel :
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location :
New Orleans, LA, USA
Print_ISBN :
0-7803-5982-8
DOI :
10.1109/PLASMA.2000.854734