DocumentCode
2202265
Title
Annealing effects on breakdown threshold of RF windows
Author
Michizono, Shinichiro ; Saito, Yoshio ; Inagaki, Atushi
Author_Institution
KEK, Nat. Lab. for High Energy Phys., Ibaraki, Japan
Volume
1
fYear
1996
fDate
21-26 Jul 1996
Firstpage
512
Abstract
The breakdown threshold of alumina RF-windows depends not only on the bulk characteristics, but also on such surface treatments as polishing and annealing. Sapphire and alumina-ceramic disks, polished and/or annealed, were examined by high-power tests. The polished disk showed a lower threshold value than did the annealed one, probably due to its surface charging at defects mechanically introduced by polishing. The elimination of surface charging is considered to be important
Keywords
alumina; annealing; electric breakdown; flashover; insulation testing; klystrons; polishing; surface charging; surface treatment; RF window breakdown threshold; annealing effects; bulk characteristics; high-power tests; klystrons; mechanical defects; polishing; surface charging; surface treatments; Annealing; Ceramics; Dielectric losses; Electric breakdown; Flashover; Luminescence; Radio frequency; Surface charging; Surface discharges; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Discharges and Electrical Insulation in Vacuum, 1996. Proceedings. ISDEIV., XVIIth International Symposium on
Conference_Location
Berkeley, CA
Print_ISBN
0-7803-2906-6
Type
conf
DOI
10.1109/DEIV.1996.545413
Filename
545413
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