DocumentCode :
2202393
Title :
Modeling studies of diamond deposition with thermal plasmas
Author :
Kolman, D. ; Breiter, M. ; Nutsch, G.
Author_Institution :
FG Plasma und Oberflachentechnik, Tech. Hochschule Ilmenau, Germany
fYear :
2000
fDate :
4-7 June 2000
Firstpage :
120
Abstract :
Summary form only given. In the case of a special DC plasma jet facility the DC plasma jet generation zone is modeled in a simple way with the given plasma power and the gas flow rates of the individual species. Based on that information of velocity, temperature, pressure, plasma density and number densities of the species in the nozzle exit plane are obtained. Next, the flow, energy and composition fields in the reactor are determined. Continuity, Navier-Stokes, conservation of energy, conservation of chemical species equations and equations of state are used for this purpose. It is assumed that the flow is generally two-dimensional, viscous, with variable transport properties, compressible (subsonic/supersonic), chemical reacting, and is treated as continuum. The chemical kinetics rates for ionization as well as chemical reactions are taken from the literature. The flow is in thermodynamic equilibrium. The substrate surface processes constitute the boundary conditions for the flow modeling. They include the energy and species exchange between the gas and the substrate. While the energy exchange is fully described by media thermal conductivities, separate models are used for the surface chemical kinetics. The model gives some interesting results. It can be shown that the better match of the pressure in the nozzle region of the plasma torch to that of the plasma reactor improves, as expected, the stability of the plasma flow.
Keywords :
diamond; digital simulation; plasma CVD; plasma density; plasma jets; plasma simulation; DC plasma jet generation zone modelling; diamond deposition modelling; gas flow rates; plasma power; thermal plasmas; Chemicals; DC generators; Inductors; Kinetic theory; Navier-Stokes equations; Plasma chemistry; Plasma density; Plasma stability; Plasma temperature; Thermal conductivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location :
New Orleans, LA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-5982-8
Type :
conf
DOI :
10.1109/PLASMA.2000.854740
Filename :
854740
Link To Document :
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