A practical view of stability analysis in discrete event dynamic systems: a case study on plasma etching system

Author

Cho, Kwang-Hyun ; Lim, Jong-Tae

Author_Institution

Dept. of Electr. Eng., Korea Adv. Inst. of Sci. & Technol., Seoul, South Korea

Volume

1

fYear

1998

fDate

11-14 Oct 1998

Firstpage

627

Abstract

There has been much interest in studying the stability properties of discrete event dynamic systems (DEDS), and several definitions for stability with some kinds of stability analysis methods have been proposed, recently. However, they are too much theory-oriented and do not provide any sufficient understanding based on real applications. Therefore, in this paper, we explore the meaning of stability concepts in DEDS through the case study of a manufacturing system, the plasma etching system in semiconductor manufacturing processes. We apply the concepts of stability and stabilizability upon a general characterization of the stability properties of automata-theoretic DEDS models. The stability notion is expounded by considering the control-law synthesis of the plasma etching system in view of stabilizability.

Keywords

control system analysis; control system synthesis; discrete event systems; semiconductor device manufacture; sputter etching; stability; automata-theoretic DEDS models; control-law synthesis; discrete event dynamic systems; manufacturing system; plasma etching system; semiconductor manufacturing processes; stability analysis; stabilizability; Automatic control; Control system synthesis; Etching; Manufacturing processes; Manufacturing systems; Plasma applications; Plasma materials processing; Plasma properties; Plasma stability; Stability analysis;

fLanguage

English

Publisher

ieee

Conference_Titel

Systems, Man, and Cybernetics, 1998. 1998 IEEE International Conference on

ISSN

1062-922X

Print_ISBN

0-7803-4778-1

Type

conf

DOI

10.1109/ICSMC.1998.725483

Filename

725483