DocumentCode :
2202994
Title :
X-ray diffraction imaging of wide bandgap materials
Author :
Poust, B. ; Feichtinger, P. ; Wojtowicz, M. ; Sandhu, R. ; Heying, B. ; Block, T. ; Khan, A. ; Goorsky, M.
Author_Institution :
Dept. of Mater. Sci. & Eng., California Univ., Los Angeles, CA, USA
fYear :
2003
fDate :
25-27 Aug. 2003
Firstpage :
12
Lastpage :
13
Abstract :
We discuss the interpretation of images of α-SiC substrates and GaN layers deposited on SiC using two common variants of diffraction imaging: double crystal (reflection) topography and Lang (transmission) topography. Dependence of image resolution on layer rocking curve breadth is demonstrated, and implication for limitations imposed by thin and defective layers are discussed.
Keywords :
X-ray diffraction; X-ray imaging; X-ray topography; crystal defects; gallium compounds; inclusions; semiconductor epitaxial layers; silicon compounds; wide band gap semiconductors; GaN; GaN layers; Lang transmission; SiC; SiC substrates; X-ray diffraction imaging; X-ray topography; defective layers; double crystal topography; image resolution; semiconductor materials; wide bandgap materials; Crystalline materials; Gallium nitride; Image resolution; Optical imaging; Photonic band gap; Reflection; Silicon carbide; Surfaces; X-ray diffraction; X-ray imaging;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductors, 2003. International Symposium on
Print_ISBN :
0-7803-7820-2
Type :
conf
DOI :
10.1109/ISCS.2003.1239881
Filename :
1239881
Link To Document :
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