DocumentCode :
2203124
Title :
Microstructure of polycrystalline GaN grown on silica glass by ECR-MBE
Author :
Araki, T. ; Ueno, T. ; Ueta, S. ; Nanishi, Y.
Author_Institution :
Dept. of Photonics, Ritsumeikan Univ., Kusatsu, Japan
fYear :
2003
fDate :
25-27 Aug. 2003
Firstpage :
25
Lastpage :
26
Abstract :
We have investigated GaN grown on silica glass using TEM. Polycrystalline GaN grown without nitridation shows columnar structure with distributed growth orientation, in which threading dislocation density is relatively low. On the other hand, polycrystalline GaN grown with nitridation has columnar structure with uniform c-axis orientation. However, a high density of threading dislocation is observed.
Keywords :
III-V semiconductors; crystal microstructure; dislocation density; gallium compounds; semiconductor epitaxial layers; transmission electron microscopy; wide band gap semiconductors; ECR-MBE; GaN; TEM; columnar structure; dislocation density; electron cyclotron resonance; microstructure; nitridation; polycrystalline GaN growth; silica glass; Amorphous materials; Buffer layers; Gallium nitride; Glass; Microstructure; Optical materials; Plasma properties; Silicon compounds; Substrates; Surface morphology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductors, 2003. International Symposium on
Print_ISBN :
0-7803-7820-2
Type :
conf
DOI :
10.1109/ISCS.2003.1239888
Filename :
1239888
Link To Document :
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