• DocumentCode
    2203230
  • Title

    Explosively formed fuses for high voltage systems

  • Author

    Tasker, D.G. ; Goforth, J.H. ; Fowler, C.M. ; Herrera, D.H. ; King, J.C. ; Lopez, E.A. ; Martinez, E.C. ; Oona, H. ; Stokes, Jamie L. ; Tabaka, L.J. ; Torres, D.T. ; Sena, F.C. ; Kiutti, G. ; Degnan, J.

  • Author_Institution
    Los Alamos Nat. Lab., NM, USA
  • fYear
    2000
  • fDate
    4-7 June 2000
  • Firstpage
    131
  • Abstract
    Summary form only given. At Los Alamos we have been adapting Explosively Formed Fuse (EFF) techniques towards the goal of producing 500 kV 1 /spl mu/s duration voltages in relatively high impedance loads. We have continued our small-scale studies over a wide range of current densities and load inductances. The new work has shed more light on our understanding of EFF operation and enabled us to numerically model switch performance for the first time. The results confirmed previous findings where it was found that metal fusing (Joule heating) has little or no effect on switch operation. Also the results demonstrated the critical relationship between switch resistance and load inductance. The findings have led to significant changes in our 76 cm EFF system design and have led to significant successes in full-scale system performance.
  • Keywords
    current density; electric fuses; electric impedance; electric resistance; explosions; high-voltage techniques; pulsed power technology; 1 mus; 500 kV; EFF operation; Joule heating; current densities; explosively formed fuses; full-scale system performance; high impedance loads; high voltage systems; load inductance; load inductances; metal fusing; switch performance; switch resistance; voltages; Current density; Fuses; Heating; Impedance; Inductance; Laboratories; Numerical models; Switches; System performance; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
  • Conference_Location
    New Orleans, LA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5982-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.2000.854773
  • Filename
    854773