Title :
Influence of electron-electron collisions on electron energy distributions and transport in inductively coupled plasmas
Author :
Vasenkov, A. ; Kushner, M.J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL, USA
Abstract :
Summary form only given, as follows. The trend towards using high-plasma density low gas pressure sources in materials processing has resulted in renewed interest in electron transport in inductively coupled plasma (ICP) discharges. Although the partial ionization in these devices can be large the electron energy distribution (EED) is generally nonMaxwellian as a result of the power being deposited in a nonuniform and non-linear fashion. As a consequence, a kinetic approach is required to properly resolve electron energy transport. In this paper we report on a computational investigation of the influence of electron-electron collisions on EEDs and electron transport in ICPs. New algorithms for electron-electron collisions have been developed and implemented into the Electron Monte Carlo Simulation of the two-dimensional Hybrid Plasma Equipment model which iterates through modules to obtain a converged solution.
Keywords :
Monte Carlo methods; plasma collision processes; plasma kinetic theory; plasma materials processing; plasma simulation; plasma sources; plasma transport processes; 2D hybrid plasma equipment model; Coulomb collisions; Coulomb momentum transfer cross section; Monte Carlo simulation; electron energy distribution; electron transport; electron-electron collisions; high-plasma density sources; kinetic approach; low gas pressure sources; partial ionization; particle-mesh; plasma materials processing; pseudo-electron particles; Electrons; Energy resolution; Fault location; Ionization; Kinetic theory; Plasma density; Plasma devices; Plasma materials processing; Plasma sources; Plasma transport processes;
Conference_Titel :
Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
Conference_Location :
Banff, Alberta, Canada
Print_ISBN :
0-7803-7407-X
DOI :
10.1109/PLASMA.2002.1030237